The P5000 platform is an AMAT multi-cavity equipment platform that can install 4 cavities, and the etching cavities include Mark II, MxP, MxP+, Super-E, etc., which can be used for the etching of silicon dioxide, silicon nitride, polysilicon, silicon, and metal materials; the CVD cavities can be used for the chemical vapor deposition of silicon dioxide, silicon nitride and tungsten metal materials; the P5000 platform has a small footprint and high space utilization, which is suitable for large-scale production; at the same time, the equipment is equipped with a powerful RF system and gas system, which can realize the compatible development of multiple processes; the P5000 series equipment can be equipped with electrostatic adsorption, and the applicable configuration can be selected according to different process requirements; the equipment has a large market retention, and the spare parts channel is perfect.